According to the statement:
Invarium’s pattern synthesis capabilities enable superior pattern resolution and faster yield ramp for designs targeted to 45-nanometer and-below process technologies. This acquisition creates the path to the industry’s leading DFM solution for functional and parametric yield improvement, enabling the prevention, detection, correction and optimization of manufacturing effects on advanced geometry designs.
Invarium’s specific area of expertise is the development of pattern synthesis technologies that enable superior photomask design and process optimization, encompassing the entire manufacturing process flow from mask making, to lithography
and etch, with industry-leading speed.